Nondestructive investigation of interface states in high-k oxide films on Ge substrate using X-ray absorption spectroscopy
Deok-Yong Cho, Hyung-Suk Jung, Il-Hyuk Yu, Won Goo Park, Suyeon Cho, Useong Kim, Se-Jung Oh, Byeong-Gyu Park, Fan-Hsiu Chang, Hong-Ji Lin, Cheol Seong HwangТом:
6
Рік:
2012
Мова:
english
Сторінки:
3
DOI:
10.1002/pssr.201206059
Файл:
PDF, 317 KB
english, 2012