Ideally Ordered Anodic Porous Alumina Mask Prepared by Imprinting of Vacuum-Evaporated Al on Si
Masuda, Hideki, Yasui, Kenji, Sakamoto, Yasuhisa, Nakao, Masashi, Tamamura, Toshiaki, Nishio, KazuyukiТом:
40
Мова:
english
Журнал:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.40.l1267
Date:
November, 2001
Файл:
PDF, 2.16 MB
english, 2001
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