[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - 14 nm FinFET Stress Engineering with Epitaxial SiGe Source/Drain
Choi, Munkang, Moroz, Victor, Smith, Lee, Penzin, OlegРік:
2012
Мова:
english
DOI:
10.1109/ISTDM.2012.6222469
Файл:
PDF, 853 KB
english, 2012