Comparison of the Stress Distribution and Fatigue Behavior of 10- and 25- $\mu\hbox{m}$-Thick Deep-Reactive-Ion-Etched Si Kilohertz Resonators
Straub, Thomas, Theillet, Pierre-Olivier, Eberl, Christoph, Pierron, Olivier N.Том:
22
Мова:
english
Журнал:
Journal of Microelectromechanical Systems
DOI:
10.1109/JMEMS.2012.2226933
Date:
April, 2013
Файл:
PDF, 1.30 MB
english, 2013