SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Step and flash imprint lithography: a new approach to high-resolution patterning
Colburn, Matthew, Johnson, Stephen C., Stewart, Michael D., Damle, S., Bailey, Todd C., Choi, Bernard, Wedlake, M., Michaelson, Timothy B., Sreenivasan, S. V., Ekerdt, John G., Willson, C. Grant, VladТом:
3676
Рік:
1999
Мова:
english
DOI:
10.1117/12.351155
Файл:
PDF, 2.97 MB
english, 1999