Low-temperature atmospheric pressure chemical vapor deposition of polycrystalline tin nitride thin films
Gordon, Roy G., Hoffman, David M., Riaz, UmarТом:
4
Мова:
english
Журнал:
Chemistry of Materials
DOI:
10.1021/cm00019a016
Date:
January, 1992
Файл:
PDF, 959 KB
english, 1992