SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Optical Microlithography XXVI - Extending immersion lithography down to 1x nm production nodes
de Boeij, Wim P., Pieternella, Remi, Bouchoms, Igor, Leenders, Martijn, Hoofman, Marjan, de Graaf, Roelof, Kok, Haico, Broman, Par, Smits, Joost, Kuit, Jan-Jaap, McLaren, Matthew, Conley, WillТом:
8683
Рік:
2013
Мова:
english
DOI:
10.1117/12.2021397
Файл:
PDF, 1.51 MB
english, 2013