High-aspect-ratio nanoporous membranes made by reactive ion etching and e-beam and interference lithography
Divan, Ralu, Makarova, Olga V., Skoog, Shelby, Narayan, Roger, Sumant, Anirudha V., Tang, Cha-Mei, Moldovan, NicolaieТом:
20
Мова:
english
Журнал:
Microsystem Technologies
DOI:
10.1007/s00542-013-1932-7
Date:
October, 2014
Файл:
PDF, 462 KB
english, 2014