All-water-based electron-beam lithography using silk as a resist
Kim, Sunghwan, Marelli, Benedetto, Brenckle, Mark A., Mitropoulos, Alexander N., Gil, Eun-Seok, Tsioris, Konstantinos, Tao, Hu, Kaplan, David L., Omenetto, Fiorenzo G.Том:
9
Мова:
english
Журнал:
Nature Nanotechnology
DOI:
10.1038/nnano.2014.47
Date:
March, 2014
Файл:
PDF, 3.74 MB
english, 2014