Effects of target voltage during pulse-off period in pulsed magnetron sputtering on afterglow plasma and deposited film structure
Nakano, Takeo, Hirukawa, Norihiko, Saeki, Shuhei, Baba, ShigeruТом:
87
Мова:
english
Журнал:
Vacuum
DOI:
10.1016/j.vacuum.2012.03.010
Date:
January, 2013
Файл:
PDF, 571 KB
english, 2013