Investigations on electrical properties of a-C:H thin films deposited in a Microwave Multipolar Plasma reactor excited at Distributed Electron Cyclotron Resonance
Kihel, M., Clergereaux, R., Escaich, D., Calafat, M., Raynaud, P., Sahli, S., Segui, Y.Том:
17
Мова:
english
Журнал:
Diamond and Related Materials
DOI:
10.1016/j.diamond.2008.01.036
Date:
July, 2008
Файл:
PDF, 366 KB
english, 2008