Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography
Jung, G. Y., Ganapathiappan, S., Ohlberg, Douglas A. A., Olynick, Deirdre L., Chen, Y., Tong, William M., Williams, R. StanleyТом:
4
Мова:
english
Журнал:
Nano Letters
DOI:
10.1021/nl049487q
Date:
July, 2004
Файл:
PDF, 452 KB
english, 2004