Enhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations
Mickiewicz, Rafal A., Yang, Joel K. W., Hannon, Adam F., Jung, Yeon-Sik, Alexander-Katz, Alfredo, Berggren, Karl K., Ross, Caroline A.Том:
43
Мова:
english
Журнал:
Macromolecules
DOI:
10.1021/ma101360f
Date:
October, 2010
Файл:
PDF, 3.57 MB
english, 2010