[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Mobility enhancement in strained Si NMOSFETs with HfO/sub 2/ gate dielectrics
Rim, K., Gusev, E.P., D'Emic, C., Kanarsky, T., Chen, H., Chu, J., Ott, J., Chan, K., Boyd, D., Mazzeo, V., Lee, B.H., Mocuta, A., Welser, J., Cohen, S.L., Leong, M., Wong, H.-S.Рік:
2002
Мова:
english
DOI:
10.1109/vlsit.2002.1015368
Файл:
PDF, 268 KB
english, 2002