Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching
Banna, S., Agarwal, A., Tokashiki, K., Hong Cho,, Rauf, S., Todorow, V., Ramaswamy, K., Collins, K., Stout, P., Jeong-Yun Lee,, Junho Yoon,, Kyoungsub Shin,, Sang-Jun Choi,, Han-Soo Cho,, Hyun-JТом:
37
Мова:
english
Журнал:
IEEE Transactions on Plasma Science
DOI:
10.1109/tps.2009.2028071
Date:
September, 2009
Файл:
PDF, 2.61 MB
english, 2009
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