Parametrization of the Stillinger-Weber potential for Si/N/H system and its application to simulations of silicon nitride film deposition with SiH4/NH3
Deng, Xiaodi, Song, Yixu, Li, JinChun, Pu, YikangТом:
115
Мова:
english
Журнал:
Journal of Applied Physics
DOI:
10.1063/1.4863841
Date:
February, 2014
Файл:
PDF, 2.36 MB
english, 2014
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