[IEEE 2013 IEEE Regional Symposium on Micro and Nanoelectronics (RSM) - Daerah Langkawi, Malaysia (2013.09.25-2013.09.27)] RSM 2013 IEEE Regional Symposium on Micro and Nanoelectronics - Fabrication of poly-silicon microwire using conventional photolithography technique: Positive resist mask vs aluminium hard mask
Nuzaihan, M. N. M., Hashim, U., Nazwa, T., Ruslinda, A. RahimРік:
2013
Мова:
english
DOI:
10.1109/rsm.2013.6706511
Файл:
PDF, 406 KB
english, 2013