[Ultra Clean Soc ISSM2000. Ninth International Symposium on Semiconductor Manufacturing - Tokyo, Japan (26-28 Sept. 2000)] Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) - Critical issues in post Cu CMP cleaning
Fyen, W., Vos, R., Teerlinck, I., Lagrange, S., Lauerhaas, J., Meuris, M., Mertens, P., Heyns, M.Рік:
2000
Мова:
english
DOI:
10.1109/issm.2000.993701
Файл:
PDF, 532 KB
english, 2000