Gas-Phase Nucleation in GaAs Thin Film Preparation by Metal Organic Chemical Vapor Deposition
Okuyama, Kikuo, Huang, David D., Seinfeld, John H., Tani, Naoyuki, Matsui, IsaoТом:
31
Мова:
english
Журнал:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.31.1
Date:
January, 1992
Файл:
PDF, 844 KB
english, 1992