Low-loss silicon waveguides with sidewall roughness reduction using a SiO 2 hard mask and fluorine-based dry etching
Lee, Dong Ho, Choo, Sung Joong, Jung, Uiseok, Lee, Kyung Woon, Kim, Kwang Woong, Park, Jung HoТом:
25
Мова:
english
Журнал:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/25/1/015003
Date:
January, 2015
Файл:
PDF, 2.36 MB
english, 2015
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