[IEEE 2010 27th International Conference on Microelectronics Proceedings - Nis, Serbia (2010.05.16-2010.05.19)] 2010 27th International Conference on Microelectronics Proceedings - Effect of RF discharge structure on silicon etching in CF4/O2
Grigoryev, Yu. N., Gorobchuk, A. G.Рік:
2010
Мова:
english
DOI:
10.1109/miel.2010.5490516
Файл:
PDF, 203 KB
english, 2010