Role of W and Mn for reliable 1X nanometer-node ultra-large-scale integration Cu interconnects proved by atom probe tomography
Shima, K., Tu, Y., Takamizawa, H., Shimizu, H., Shimizu, Y., Momose, T., Inoue, K., Nagai, Y., Shimogaki, Y.Том:
105
Мова:
english
Журнал:
Applied Physics Letters
DOI:
10.1063/1.4896961
Date:
September, 2014
Файл:
PDF, 1.78 MB
english, 2014