Potential applications of an electron cyclotron resonance multicusp plasma source
Tsai, C. C.Том:
8
Мова:
english
Журнал:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.576646
Date:
May, 1990
Файл:
PDF, 693 KB
english, 1990