Barrier Strain and Carbon Incorporation-Engineered Performance Improvements for AlGaN/GaN High Electron Mobility Transistors **
Luong, Tien Tung, Ho, Yen Teng, Tran, Binh Tinh, Woong, Yuen Yee, Chang, Edward YiТом:
21
Мова:
english
Журнал:
Chemical Vapor Deposition
DOI:
10.1002/cvde.201407100
Date:
March, 2015
Файл:
PDF, 1.72 MB
english, 2015