Deformation Mode Construction Using Photoresist Microstructure Devices Produced with Nanoindention Technology
Weng, Yung Jin, Weng, Yung Chun, Liu, Hsu Kang, Chiu, Lin HsiungТом:
447-448
Мова:
english
Журнал:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.447-448.539
Date:
September, 2010
Файл:
PDF, 461 KB
english, 2010