Low-temperature, rapid thermal annealing of CIS thin films deposited by using a co-sputtering process with in and CuSe2targets
Kim, Nam-Hoon, Sung, Back-Sub, Jun, Young-Kil, Chung, Dong Hyun, Lee, Woo-SunТом:
66
Мова:
english
Журнал:
Journal of the Korean Physical Society
DOI:
10.3938/jkps.66.1001
Date:
March, 2015
Файл:
PDF, 368 KB
english, 2015
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