Triple patterning lithography layout decomposition using end-cutting
Yu, Bei, Roy, Subhendu, Gao, Jhih-Rong, Pan, David Z.Том:
14
Мова:
english
Журнал:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.jmm.14.1.011002
Date:
November, 2014
Файл:
PDF, 1.03 MB
english, 2014