Post-process die-level electromagnetic field analysis on microwave CMOS low-noise amplifier for first-pass silicon fabrication success
Eshghabadi, Farshad, Banitorfian, Fatemeh, Mohd Noh, Norlaili, Mustaffa, Mohd Tafir, Abd Manaf, AsrulnizamМова:
english
Журнал:
Integration, the VLSI Journal
DOI:
10.1016/j.vlsi.2015.03.001
Date:
March, 2015
Файл:
PDF, 5.64 MB
english, 2015