SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - An ultra-narrow FinFET poly-Si gate structure fabricated with 193nm photolithography and in-situ PR/BARC and TEOS hard mask etching
Liao, Wen-Shiang, Wu, Cheng-Han, Tang, Mao-Chyuan, Huang, Sheng-Yi, Shih, Tommy, Liaw, Yue-Gie, Chen, Kun-Ming, Chen, Tung-Hung, Tsen, Huan-Chiu, Chung, Lee, Schellenberg, Frank M.Том:
6921
Рік:
2008
Мова:
english
DOI:
10.1117/12.769591
Файл:
PDF, 363 KB
english, 2008
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