[ECS 215th ECS Meeting - San Francisco, CA (May 24 - May 29, 2009)] ECS Transactions - Advanced FinFET Devices for Sub-32nm Technology Nodes: Characteristics and Integration Challenges
Veloso, Anabela, Collaert, Nadine, De Keersgieter, An, Witters, Liesbeth, Rooyackers, Rita, Van Dal, Mark J., Duffy, Ray, Pawlak, Bartek J., Lander, Rob J., Hoffmann, Thomas, Biesemans, Serge, JurczakРік:
2009
Мова:
english
DOI:
10.1149/1.3117391
Файл:
PDF, 1.83 MB
english, 2009