Line-Profile and Critical-Dimension Monitoring Using a Normal Incidence Optical CD Metrology
Yang, W., Hu, J., Lowe-Webb, R., Korlahalli, R., Shivaprasad, D., Sasano, H., Liu, W., Mui, D.S.L.Том:
17
Мова:
english
Журнал:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2004.835728
Date:
November, 2004
Файл:
PDF, 1.75 MB
english, 2004