Vacancy Formation Energy of Silicon Determined by a New Quenching Method
Fukata, Naoki, Kasuya, Atsuo, Suezawa, MasashiТом:
40
Мова:
english
Журнал:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.L854
Date:
August, 2001
Файл:
PDF, 153 KB
english, 2001