Local distribution of residual stress of Cu in LSI interconnect
Sato, Hisashi, Shishido, Nobuyuki, Kamiya, Shoji, Koiwa, Kozo, Omiya, Masaki, Nishida, Masahiro, Suzuki, Takashi, Nakamura, Tomoji, Nokuo, TakeshiТом:
136
Мова:
english
Журнал:
Materials Letters
DOI:
10.1016/j.matlet.2014.08.088
Date:
December, 2014
Файл:
PDF, 1.69 MB
english, 2014