[IEEE 2014 IEEE International Integrated Reliability Workshop Final Report (IIRW) - South Lake Tahoe, CA, USA (2014.10.12-2014.10.16)] 2014 IEEE International Integrated Reliability Workshop Final Report (IIRW) - Nanoprobing EBAC technique to reveal the failure root cause of gate oxide reliability issues of an IC process
Tan, P. K., Dawood, M. K., Low, G. R., Yap, H. H., He, R., Moon, S. J., Feng, H., Tan, H., Huang, Y. M., Wang, D. D., Zhao, Y. Z., Zhou, Y., James, S., Chen, C. Q., Lam, J., Mai, Z. H.Рік:
2014
Мова:
english
DOI:
10.1109/iirw.2014.7049496
Файл:
PDF, 3.55 MB
english, 2014