Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks
S. J. Ullal, H. Singh, J. Daugherty, V. Vahedi, E. S. AydilРік:
2002
Мова:
english
DOI:
10.1116/1.1502698
Файл:
PDF, 550 KB
english, 2002