Hybrid high resolution lithography (e-beam/deep ultraviolet) and etch process for the fabrication of stacked nanowire metal oxide semiconductor field effect transistors
S. Pauliac-vaujour, C. Comboroure, C. Vizioz, S. Barnola, P. Brianceau, V. M. Alvaro, C. Dupré, T. ErnstРік:
2008
Мова:
english
DOI:
10.1116/1.3021392
Файл:
PDF, 1.40 MB
english, 2008