Improvements of Electrical Characteristics of Hf/p-Si(100) Interfaces by H-Termination
Zaima, Shigeaki, Kojima, Jun, Hayashi, Masakazu, Ikeda, Hiroya, Iwano, Hirotaka, Yasuda, YukioТом:
34
Мова:
english
Журнал:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.741
Date:
February, 1995
Файл:
PDF, 151 KB
english, 1995