SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - New ionic photo-acid generators (PAGs) incorporating novel perfluorinated anions
Lamanna, William M., Kessel, Carl R., Savu, Pat M., Cheburkov, Yuri, Brinduse, Steve, Kestner, Thomas A., Lillquist, Gerald J., Parent, Mike J., Moorhouse, Karrie S., Zhang, Yifan, Birznieks, Grant, KТом:
4690
Рік:
2002
Мова:
english
DOI:
10.1117/12.474284
Файл:
PDF, 105 KB
english, 2002
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