Boron Doping of Hydrogenated Silicon Thin Films
Matsuda, Akihisa, Matsumura, Mitsuo, Yamasaki, Satoshi, Yamamoto, Hideo, Imura, Takeshi, Okushi, Hideyo, Iizima, Sigeru, Tanaka, KazunobuТом:
20
Мова:
english
Журнал:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.20.L183
Date:
March, 1981
Файл:
PDF, 138 KB
english, 1981