SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Fabrication of optical film derived from biomass using eco-friendly nanoimprint lithography
Takei, Satoshi, Murakami, Gaku, Mori, Yuto, Ichikawa, Takumi, Sekiguchi, Atsushi, Obata, Tsutomu, Yokoyama, Yoshiyuki, Mizuno, Wataru, Sumioka, Junji, Horita, Yuji, Somervell, Mark H.Том:
8682
Рік:
2013
Мова:
english
DOI:
10.1117/12.2010645
Файл:
PDF, 461 KB
english, 2013
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