Influences of alpha-substituent in 4,5-dimethoxy-2-nitrobenzyl-protected esters on both photocleavage rate and subsequent photoreaction of the generated 2-nitrosophenyl ketones: A novel photorearrangement of 2-nitrosophenyl ketones
Kasuga, Noriko Chikaraishi, Saito, Yusuke, Okamura, Naomichi, Miyazaki, Tatsuya, Satou, Hikaru, Watanabe, Kazuhiro, Ohta, Takaaki, Morimoto, Shu-hei, Yamaguchi, KazuoТом:
321
Мова:
english
Журнал:
Journal of Photochemistry and Photobiology A: Chemistry
DOI:
10.1016/j.jphotochem.2016.01.012
Date:
May, 2016
Файл:
PDF, 1.23 MB
english, 2016
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