Metalorganic chemical vapor deposition and characterization of (Al,Si)O dielectrics for GaN-based devices
Chan, Silvia H., Tahhan, Maher, Liu, Xiang, Bisi, Davide, Gupta, Chirag, Koksaldi, Onur, Li, Haoran, Mates, Tom, DenBaars, Steven P., Keller, Stacia, Mishra, Umesh K.Том:
55
Мова:
english
Журнал:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.021501
Date:
February, 2016
Файл:
PDF, 1.98 MB
english, 2016