SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Ultra-thin-film EUV resists beyond 20nm lithography
Nakagawa, Hiroki, Allen, Robert D., Somervell, Mark H., Fujisawa, Tomohisa, Goto, Kentaro, Kimura, Tooru, Kai, Toshiyuki, Hishiro, YoshiТом:
7972
Рік:
2011
Мова:
english
DOI:
10.1117/12.879303
Файл:
PDF, 1.66 MB
english, 2011