SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Resnick, Douglas J., Bencher, Christopher, Ma, Yuansheng, Lei, Junjiang, Torres, J. A., Hong, Le, Word, James, Fenger, Germain, Tritchkov, Alexander, Lippincott, George, Gupta, Rachit, Lafferty, Neal,Том:
9423
Рік:
2015
Мова:
english
DOI:
10.1117/12.2085850
Файл:
PDF, 2.10 MB
english, 2015
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