Correlation of The Mechanical Properties of Silicon Oxynitride Films to Processing Parameters, Film Stoichiometry, and Hydride Bond Concentration
Moinpour, Mansour, Moghadam, Farhad, Williams, ByronТом:
391
Мова:
english
Журнал:
MRS Proceedings
DOI:
10.1557/proc-391-479
Date:
January, 1995
Файл:
PDF, 393 KB
english, 1995