Measuring The Work Functions Of PVD TaN, TaSiN And TiSiN Films With A Schottky Diode CV Technique For Metal Gate CMOS Applications
Pan, James, Woo, Christy, Ngo, Minh-Van, Tracy, Bryan, Adem, Ercan, Robie, Stephen, Xiang, Qi, Lin, Ming-RenТом:
745
Мова:
english
Журнал:
MRS Proceedings
DOI:
10.1557/proc-745-n3.2
Date:
January, 2002
Файл:
PDF, 406 KB
english, 2002
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