SPIE Proceedings [SPIE Smart Materials, Nano-and Micro-Smart Systems - Melbourne, Australia (Tuesday 9 December 2008)] Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems IV - Wet anisotropic etching by TMAH with NCW-1002 surfactant on crystalline silicon surface
Chiao, Jung-Chih, Xu, Yi Wei, Michael, Aron, Hariz, Alex J., Thiel, David V., Kwok, Chee Yee, Yang, ChangyiТом:
7269
Рік:
2008
Мова:
english
DOI:
10.1117/12.810451
Файл:
PDF, 737 KB
english, 2008
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