Effects of Bias Pulsing on Etching of SiO2 Pattern in Capacitively-Coupled Plasmas for Nano-Scale Patterning of Multi-Level Hard Masks
Kim, Sechan, Choi, Gyuhyun, Chae, Heeyeop, Lee, Nae-EungТом:
16
Мова:
english
Журнал:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2016.12232
Date:
May, 2016
Файл:
PDF, 3.74 MB
english, 2016