SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Design of a high positioning contact probe for plasmonic lithography
Jang, Jinhee, Kim, Yongwoo, Kim, Seok, Jung, Howon, Hahn, Jae W., Tong, William M.Том:
8323
Рік:
2012
Мова:
english
DOI:
10.1117/12.916274
Файл:
PDF, 1.58 MB
english, 2012