SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - The effect of EUV molecular glass architecture on the bulk dispersion of a photo-acid generator
Henderson, Clifford L., VanderHart, David L., De Silva, Anuja, Felix, Nelson, Prabhu, Vivek M., Ober, Christopher K.Том:
6923
Рік:
2008
Мова:
english
DOI:
10.1117/12.773048
Файл:
PDF, 766 KB
english, 2008